| 摘要 |
Method of preparing silicon nitride film by glow discharge from the decomposition of liquid trisilylamine, (SiH3)3N, which is a volatile monomer. In this connection, the use of a single monomer as diluted with an inert gas enables greater uniformity to be achieved in the deposition of silicon nitride films. Further, the presence of Si-N bonds in the monomer enables more control and better stoichiometry in the deposited films.
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