| 摘要 |
PURPOSE:To considerably improve storage stability by containing organic acids in the photosensitive layer which is making contact directly or by way of an intermediate layer with a silicone rubber layer as ink repulsion layer. CONSTITUTION:Organic acids (succinic acid, maleic acid, copolymer of unsaturated organic acids, etc.) of 0.01-1mg equivalent/g, preferably 0.02-0.5mg equivalent/g of concentration in the photosensitive layer composition are added at the time of providing a photosensitive resin layer on a substrate such as of Al or the like. On this photosensitive layer is provided a silicone rubber layer as an ink repulsion layer or is provided a silicone rubber layer by way of an intermediate layer composed of silicone primer, etc. The organic acids are effectual in preventing heat polymerization under light shielding of the photosensitive layer, suppressing the hardening of silicone rubber with time at the photosensitive layer interface of the silicone rubber, stabilizing interface adhesion and preventing thermal fading of dyes of the photosensitive layer. Hence, this is effective for stabilization of the lithographic material. |
