发明名称 |
DRY ETCHING EQUIPMENT AND CASSETTE |
摘要 |
<p>PURPOSE:To prevent corrosion of Al on the surface of a dry-etched wafer, by depositing chlorine ions on the wafer surface by a vacuum vaporization by a method wherein sheet-like heaters are incorporated in a cassette for unloading. CONSTITUTION:In a cassette 12 for unloading to store dry-etched wafers 7, sheet-like heaters 15 are located at fixed distances. The wafers 7 are stored between the heaters 15. The heaters 15 heat the wafers 7 to a temperature so that chlorine ion corrosive material attached to the surface of the wafers 7 is vaporized. Vaporized gases are exhausted. Since the dry-etched wafers 7 are heated in the cassette 12 before being taken out of the equipment, chlorine ions on the surface of the wafers 7 is vaporized in a vacuum to be exhausted. As a result, corrosion of Al on the surface of the etched wafers 7 is prevented.</p> |
申请公布号 |
JPH01243522(A) |
申请公布日期 |
1989.09.28 |
申请号 |
JP19880069519 |
申请日期 |
1988.03.25 |
申请人 |
HITACHI LTD;HITACHI TOKYO ELECTRON CO LTD |
发明人 |
MURAMATSU KIMIO;UEYAMA KEIJI;SANO YOSHIYASU;FUJIWARA KAZUAKI |
分类号 |
H01L21/302;H01L21/3065;H01L21/677 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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