| 摘要 |
PURPOSE:To enable a picture to be drawn directly on a wafer with high-speed and high-accuracy, by an information from a 3-axis laser length measuring equipment and a mark position detecting information using electronic beam, in an electronic exposure device capable of drawing a picture while sending data continuously by vector seanning system. CONSTITUTION:By returning a horizontal-rotating motion amount to an electronic beam deflection device 4 for large region from inside of flat surface of a test specimen-shifting table 7 by using a 3-axis laser length measuring equipment 8, continuous radiation is made possible regardless of shifting of the soecimen-shifting table 7. By radiating a positioning mark on a chip by the large-region electronic beam deflection device 4, and further, by detecting a mark position by scanning of a small-region electronic beam deflection device 3, the radiating position is compensated for with a calculator 13 using the result. As it is possible to compensate for the beam radiating position and also to detect the mark position in this manner, an electronic beam radiating position can be decided while compensating the radiating position and without any discrepancy in the radiating position. |
