发明名称 ELECTRON BEAM VAPOR DEPOSITION APPARATUS
摘要 PURPOSE:To form the vapor-desposited film of alloy etc. without losing material or time loss, by heating and melting the tip part of needlewire-shaped evaporation material drawing from passing hole opened to the surface of liner by electron shock and moreover, evaporating laminer evaporation material spread over the surface of the liner. CONSTITUTION:The needle-shaped wire 7 made of Al alloy etc., is led out nearly to the surface of the liner 5 and the electron beam 2 is generated from the electron gun 1. Then, shock is given on the tip part of the wire not only the surface of the liner 5 by the beam 2. As a result, upper surface of the liner 5 is wetted melting the tip of the wire 7 by heating and the wire 7 is spread in thin layer. Then, the evaporation material spread in layer, is heated by conduction heat from the liner 5 heated by the electron shock and is vapor-deposited on the material to be vapor-deposited 11 evaporating extremely in a short time. Also, the evaporation material lost from the upper face of the liner 5, is supplied by drawing out the wire 6 at a fixed speed.
申请公布号 JPS5550463(A) 申请公布日期 1980.04.12
申请号 JP19780123010 申请日期 1978.10.05
申请人 NIPPON ELECTRON OPTICS LAB 发明人 KOGA KIKUO
分类号 C23C14/30 主分类号 C23C14/30
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