METHOD OF AND DEVICE FOR PROVIDING THIN LAYERS BY CATHODE SPUTTERING

摘要

A mould and supporting dish for dry-compressed powder targets which are constructed so that adsorbed residual gases can readily escape during the evacuation process of the cathode sputtering device via substantially all the surfaces of the powder target, so that the powder target during the evacuation process is not torn or its structure damaged. The adsorbed residual gases can escape through apertures in the bottom of the supporting dish and in the side wall of the supporting dish.