SEMICONDUCTOR DIFFUSION PROCESS

摘要

A method of manufacturing a semiconductor device in which a layer of polycrystalline material having a high impurity concentration is used prior to the diffusion of a thin region having a strong surface concentration and prior to providing a contact to the said region. The polycrystalline layer is comparatively thick prior to the diffusion and is reduced in thickness before the metal contact is provided. Application: the manufacture of bipolar transistors for very high frequencies and integrated circuits with multilayer wiring.