发明名称 |
Capacitively coupled array of photodetectors |
摘要 |
A plurality of metal deposits are formed on the insulated surface of a semiconductive material to create an array of capacitive photodetectors. A plurality of metal columns connect the metal deposit of each photodetector to a corresponding metal deposit on the insulated surface of a silicon charge-coupled device (CCD). In this manner, the voltage signal generated in each photodetector is capacitively coupled to the charge-coupled device. The metal deposit on the CCD forms a gate for a fill/spill circuit which provides the input to the charge-coupled device. In a preferred embodiment, a bi-polar fill/spill circuit is used to provide an input to the CCD which is proportional to the change in voltage of a photodetector during a predetermined clocking period.
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申请公布号 |
US4197469(A) |
申请公布日期 |
1980.04.08 |
申请号 |
US19780909330 |
申请日期 |
1978.05.25 |
申请人 |
ROCKWELL INTERNATIONAL CORP |
发明人 |
CHEUNG, DEREK T |
分类号 |
G11C19/28;G11C27/04;H01L27/148;H01L29/768;(IPC1-7):G11C19/28;H01L27/14;H01L29/78;H01L31/00 |
主分类号 |
G11C19/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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