发明名称 SEMICONDUCTOR DEVICE HAVING A HETERO JUNCTION
摘要 <p>A semiconductor device comprising a silicon substrate with an oxygen doped polycrystalline or amorphous silicon layer formed on the substrate so as to form a hetero junction therewith. A transistor formed according to the invention has an emitter-base hetero junction and has a high current gain.</p>
申请公布号 CA1075373(A) 申请公布日期 1980.04.08
申请号 CA19760251094 申请日期 1976.04.27
申请人 SONY CORPORATION 发明人 MATSUSHITA, TAKESHI;HAYASHI, HISAO;SHIBASAKI, MITSURU
分类号 H01L21/00;H01L21/205;H01L21/314;H01L21/316;H01L21/331;H01L21/337;H01L23/29;H01L23/31;H01L27/06;H01L29/04;H01L29/10;H01L29/16;H01L29/165;H01L29/43;H01L29/45;H01L29/73;H01L29/737;H01L29/80;H01L29/808;(IPC1-7):01L27/04;01L21/22 主分类号 H01L21/00
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