发明名称 MANUFACTURE OF BORON NITRIDE COATED FILM BY CHEMICAL VAPOR DEPOSITION
摘要 PURPOSE:To form boron nitride coating having high purity and high density on a substrate contg. iron group metals at ordinary press. and at a temp. lower than that for conventional method, by introducing a reaction gas contg. NH3, BCl3 etc. on the substrate so as to metallize the substrate chemically. CONSTITUTION:A reaction gas is brought into contact with a heated substrate contg. iron group elements in respective ranges of flow rate of components, i.e., 0.2-3.0ml/sec. NH3 or N2H4, 0.5-1.0ml/sec. BCl3 or B2H6, 0.2-4.0ml/sec. H2, and 0.2-4.0ml/sec. inert gas such as Ar. Hereby a coating of hexagonal system crystals of boron nitride 2 mum in thickness are formed on the substrate by chemical metallizing. The thickness of the coating increases linearly with increase in the metallizing time to form a coating not smaller than 500mum in thickness. For the substrate is used an alloy or a cpd. including a single iron group element, e.g., iron, cobalt, or two or more members of iron group elements.
申请公布号 JPS5547379(A) 申请公布日期 1980.04.03
申请号 JP19780120389 申请日期 1978.10.02
申请人 TAKAHASHI TAKEHIKO;ITO HIDEAKI 发明人 TAKAHASHI TAKEHIKO;ITOU HIDEAKI
分类号 C23C16/34 主分类号 C23C16/34
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