发明名称 PHOTOORESIST MASK MANUFACTURING METHOD
摘要 PURPOSE:To enable a mask to prolong its service life by plating a metal in a mask pattern and using thus plated film as a mask pattern. CONSTITUTION:A mask pattern 8 is printed on a copper plate 7, and after an exfoliating agent is coated, electroplating is conducted with the copper plate 7 as an electrode, so that metal contained on a plating liquid is plated into the mask pattern 8 printed on the copper plate 7. And then, the copper plate 7 is taken out, and a plated film 9 is exfoliated form the copper plate and attached onto a glass plate with an adhesive, so that a mask for photo-resist is produced.
申请公布号 JPS5543818(A) 申请公布日期 1980.03.27
申请号 JP19780115911 申请日期 1978.09.22
申请人 HITACHI LTD 发明人 SHIMIZU ISAMU
分类号 H05K3/00;C25D1/00;G03F1/00;G03F1/54;G03F1/68;G03F7/00;H01L21/027;H01L21/302 主分类号 H05K3/00
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