| 摘要 |
PURPOSE:To draw polygonal patterns with smooth slanting lines with high precision, by the combined use of an electron beam which scans in the direction perpendicular to the movement of a stage and an electron beam which scans in the direction of a desired angle. CONSTITUTION:While stage 7 is being moved in a fixed direction, an electron beam is radiated from electron gun 1 and it is made to converge by lens systems 2a, 2b and 2c. By operating control device 8, a pattern information is sent to polarization control circuit 6. By means of polarizing plate 5, the electron beam is made to scan in the direction perpendicular to the movement of stage 7 and three rectangular electron beam irradiation regions are formed successively on the resist film on mask plate 9. Next, a different pattern information is sent to circuit 6, and the electron beam is made to scan in the direction of an angle of 45 deg. with respect to the direction of movement of stage 7. By this, a diamond-shaped electron beam irradiation region whose long diagonal is inclined 45 deg. is formed, and a pentagonal pattern is drawn. |
