| 摘要 |
PURPOSE:To improve a precision of photoresist process by providing a precise thermostat on a portion where to mount photomask and wafer and also on a portion where to enclose unsensitized wafer. CONSTITUTION:There is provided a precise thermostat in an area A including a stage part 4 to mount a wafer for photoresist sensitizing process and a photomask 5 holding part and also in an area B to enclose a multitude of unsensitized wafers at a stage preceding to photoresist sensitizing process, and temperatures on those portions and room temperature are adjusted to coincide with a set temperature. A photoresist error to occur according to thermal expansion is minimized consequently to improve a pattern precision by photoresist process. |
