| 摘要 |
PURPOSE:To constitute the device that the processed object is moved to the abrasive grain processing part, the cleaning part provided between the abrasive grain processing part and the receiving part which tempolarily supports the processed object, and the receiving part according to the constant sequence to achieve highly precise processing. CONSTITUTION:The device to polish the processed object W is constituted by the head part 1, the abrasive grain processing part 2, the cleaning part 3, the receiving part 4, and the head driving mechanism 5, etc. Then, the head part 1 is shifted from the processing part 2 to be cleaned at the cleaning part 3 which is provided apart from the processing part 2 so that the head part 1 is cleaned easily and completely. Therefore, the processed object W is accurately mounted on the head part 1, and the abrasive grain processing accuracy can be remarkably improved. As the processed object W is mounted or removed on the head part 1 by pressure reducing or pressurizing, the accuracy can also by improved compared to that with the adhesives. |
