发明名称 SELECTIVE ETCHING PROCESS FOR CHANGING SHADOW-MASK APERTURE SIZE
摘要 The shadow mask of a color picture tube is formed by etching a blank to provide a field of apertures individually having a large diameter portion and a coaxially aligned, small diameter portion attached to the former by a thin wall section. In screening a tube which is to utilize such a shadow mask for color selection, the phosphor materials are deposited on the screen in a photographic process involving the exposure of a layer of photosensitive material by actinic energy directed through the small diameter portions of the mask apertures. After screening has been accomplished, the thin wall sections are etched away, leaving the mask with apertures of large diameter, larger than the phosphor deposits in the screen.
申请公布号 US3653900(A) 申请公布日期 1972.04.04
申请号 USD3653900 申请日期 1969.08.15
申请人 ZENITH RADIO CORP. 发明人 JOSEPH M. BLACK
分类号 H01J9/14;H01J29/07;(IPC1-7):G03C5/00 主分类号 H01J9/14
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