摘要 |
PURPOSE:To reduce deterioration of dot quality even in a running state using an automatic developing unit, by developing a lithographic photosensitive material containing 50mol% or more more silver chloride based on silver halide in the presence of a specified compound. CONSTITUTION:An imagewise exposed silver halide photographic material containing silver chlorobromide or chloroiodobromide, preferably containing silver chloride 60mol% or more, silver bromide 40mol% or less, and silver iodide 5mol% or less is developed in the presence of a compound of the formula in which X is H, lower alkyl, or aryl; R1, R2, and R3 are H or lower alkyl; R4 is alkyl, aryl, -NHR5; R5 is H, alkyl, or aryl; m is 2-200; n1+n2 are 3-200; and l is 1-11. The formula compound is preferably added to a silver halide emulsion layer of a lithographic sensitive material. |