发明名称 Process and device for checking substrate wafers
摘要 Polished single crystal wafers are checked for defects by means of a method employing a optical microscope. The image is blurred by a translucent material and the transmitted light is then sensed by a light sensitive instrument which records the increased light intensity caused by a defect passing through the field of view. The position of the defects are then plotted automatically.
申请公布号 US4194127(A) 申请公布日期 1980.03.18
申请号 US19780887516 申请日期 1978.03.17
申请人 SWISS ALUMINIUM LTD 发明人 SCHMIDT, WALTER
分类号 G01N21/95;(IPC1-7):G01N21/32 主分类号 G01N21/95
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