| 摘要 |
There is described an apparatus for use in high resolution lithographic techniques. The apparatus includes a microchannel array plate for providing a large area electron source with small divergence angle. The electrons can be used directly, in transmission electron lithography, or as a source for producing x-rays for x-ray lithography. The microchannel array plate is used to control the divergence angle of the electrons (especially in the transmission electron lithography technique) as well as the x-rays (in x-ray lithography techniques). That is, in the x-ray lithography technique the microchannel array plate collimates x-rays which are generated in response to electrons striking a suitable source.
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