| 摘要 |
PURPOSE:To form a homogeneous optical thin film without causing a fractionating effect by frranging equally or unequally a plurality of vacuum-deposition materials with different refractive indexes on a stage and by turning the stage to successively irradiate the materials with electron beams and to evaporate the materials while always stabilizing the evaporation. CONSTITUTION:Vacuum-deposition materials with different refractive indexes, e.g. TiO212a and MgF212b are arranged in crucible 10 on a stage to be irradated with electron beams (d). Next rotary stand 9 is turned to successively irradiate materials 12a, 12b with beams (d), whereby the materials are evaporated and deposited on sample substrate 4 and film thickness monitoring substrate 7. By this method the materials are evaporated with single electronic gun filament 11, so stable vapor currents are scattered from evaporation source 2. Since the materials are successively irradiated with electron beams, they are evaporated almost simultaneously and deposited on substrate 4, causing no fractionating effect even if they are different in vapor press. |
