发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide clear contrast between the exposed part and unexposed part and give sufficient sensitivity, by containing photo-polymerizing or photo-crosslinking ethylenic unsaturated compound, and specific free radical producing agent, sensitizer and dye precursor. CONSTITUTION:A photosensitive resin composition used in PS plate, etc. is prepared by containing a free radical producing agent of formula I (X1 to X3 are H, Cl, Br, and more than one being Cl, Br; Y is represented by formula II, where X1 to X3 are the same as above, and -NH2, -NHR', -SR', OR', or -R', and R' is alkyl, aryl, alkenyl), a compound of formula III [Z is a nonmetallic atom group necessary for formation of heterocyclic uncleus containing nitrogen, R1 is a (substituted) alkyl; R2 is alkyl, (substituted) aryl], a dye precursor to color the dye by free radical or by acid, and photo-polymerizing or photo-crosslinking ethylenic unsaturated compound. Thus, the sharpness of the image and sensitivity may be enhanced.
申请公布号 JPS5532070(A) 申请公布日期 1980.03.06
申请号 JP19780105196 申请日期 1978.08.29
申请人 FUJI PHOTO FILM CO LTD 发明人 NAGASHIMA AKIRA;SATOU SHIGERU
分类号 G03F7/004;C08F2/48;C08F2/50;G03C1/00;G03C1/675;G03C5/00;G03F7/029;G03F7/039 主分类号 G03F7/004
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