发明名称
摘要 A p-n junction type solid-state element having a substrate, a substrate electrode coated on the substrate, a p-n junction type semiconductor layer coated on the substrate having the substrate electrode thereon, and an upper terminal electrode coated on the p-n junction type semiconductor layer; in which the p-n junction type semiconductor layer is formd by coating an n-type (or p-type) semiconductor layer on the substrate having the substrate electrode thereon by the ion-plating method and then by forming a p-type (or n-type) semiconductor layer in the upper surface region of the n-type (or p-type) seminconductor layer by the ion-implantation method.
申请公布号 JPS558825(B2) 申请公布日期 1980.03.06
申请号 JP19750156808 申请日期 1975.12.30
申请人 发明人
分类号 H01L31/04;C23C14/22;H01L21/203;H01L21/268;H01L21/285;H01L31/0392;H01L31/10;H01L31/18 主分类号 H01L31/04
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