A gas distribution device for the supply of a processing gas to an atomizing chamber.

摘要

A gas distribution device for the supply of a processing gas to the atomizing zone around an atomizing device (1) arranged centrally in an atomizing chamber, said gas distribution device comprises a conical guide duct (10) communicating with a horizontal spiral supply duct (8) through an annular mouth (9). A uniform gas distribution with respect to flow direction and velocity is obtained by means of guide vanes (15, 16) arranged with a small annular spacing inthe mouth (9) and comprising two succeeding vein sets, in which the vanes (15) of one set are shaped to deflect the tangential gas stream in the spiral duct (8) to a flow direction, for which the radial velocity component considerably exceeds the tangential component, whereas each vane (16) of the other set positioned at the opening of the mouth towards the conical guide duct (10) projects into the space between neighbouring vanes (15) of the first set and extends substantially parallel to tangential planes to said vanes (15) at their internal edges.