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发明名称
FORMING METHOD OF SEMICONDUCTOR AREA
摘要
申请公布号
JPS5530808(A)
申请公布日期
1980.03.04
申请号
JP19780102722
申请日期
1978.08.25
申请人
HITACHI LTD
发明人
KATOU HIDEAKI
分类号
H01L21/8222;H01L21/331;H01L27/08;H01L27/082;H01L29/08;H01L29/72;H01L29/73
主分类号
H01L21/8222
代理机构
代理人
主权项
地址
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