METHOD OF FORMING PATTERN IN SEMICONDUCTOR DEVICE,申请号JP19780103560-传众专利搜索

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发明名称	METHOD OF FORMING PATTERN IN SEMICONDUCTOR DEVICE
摘要
申请公布号	JPS5530830(A)	申请公布日期	1980.03.04
申请号	JP19780103560	申请日期	1978.08.25
申请人	FUJITSU LTD	发明人	KANAZAWA MASAO
分类号	G03F7/20;H01L21/027;H01L21/302	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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