| 摘要 |
PURPOSE:To raise the accuracy of matching two layers, by providing equal distances between the black and white portions of patterns by placing cell patterns for measuring in one chip of one mask. CONSTITUTION:Resistor layers R1-R4 are made of patterns 1 and 2 for detecting matching degree in terms of the variation of resistance value. If measuring cell patterns 1A and 2A are provided in one chip of a matching accuracy estimation mask, complete matching can be performed with the center of said patterns 1A and 2A even though chips shift on step and repeat. The outside of the cell 1A constituting layers R1-R4 and the pattern of a cell 2A are black. Therefore, the distances between the both patterns of chips can be equalized on mask even though the black portions of said chips increase or decrease uniformly because exposure on step and repeat occurs at different times. Further, a matching target pattern is provided in the same chip as said measuring cell pattern and targets 6 and 5 are placed one upon the other so that said measuring patterns 1A and 2A are completely overlapped in the whole chips. |
