发明名称 CONTROLLING METHOD FOR EVAPORATION RATE IN VACUUM METALLIZING UNIT
摘要 PURPOSE:To make it possible to conduct plural metallization automatically and simultaneously at a high degree of precision in vacuum metallization by resistance heating, by determining the center value of power to be supplied in the next time interval on the basis of the difference between the center value of the set power to be supplied to a time interval and the power actually supplied in the time interval. CONSTITUTION:At first an objective metallizing rate V and the objective center value Ac of the power to be supplied to a metallizing source in a time interval T1 are determined. When the value Ac is larger than the mean value of the power actually supplied to the metallizing source, the center value Ac for the next time interval T2 is determined by decreasing a value given by multiplying the difference between both the values with a constant from the center value Ac, i.e., the value Ac for the next time interval T2 is smaller than that for the time interval T1. Hereby, the center value of the power to be supplied in the next time interval is determined based on the difference between the set center value of the power to be supplied in a time interval and the mean value of the power actually supplied in the time interval.
申请公布号 JPS5528345(A) 申请公布日期 1980.02.28
申请号 JP19780100940 申请日期 1978.08.21
申请人 HITACHI LTD 发明人 TAKABE YOUJIROU;SATOU MASASHI;FUJITA AKIRA
分类号 C23C14/24;C23C14/54 主分类号 C23C14/24
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