发明名称 Trim structure for integrated capacitors
摘要 A capacitor suitable for integration into a monolithic integrated circuit is fabricated in two parallel connected sections. One section, using a thin oxide, constitutes most of the capacitance. A second section fabricated on a thick oxide constitutes a smaller capacitance per unit area but can be laser trimmed to provide a precise capacitance without damage to the integrated circuit. The trimmable section is desirably made using a conductive electrode material that is readily removed with laser energy.
申请公布号 US4190854(A) 申请公布日期 1980.02.26
申请号 US19780877915 申请日期 1978.02.15
申请人 NATIONAL SEMICONDUCTOR CORP 发明人 REDFERN, THOMAS P
分类号 H01L23/522;H01L23/525;H01L27/08;H01L29/94;(IPC1-7):H01L27/00 主分类号 H01L23/522
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