发明名称 |
Trim structure for integrated capacitors |
摘要 |
A capacitor suitable for integration into a monolithic integrated circuit is fabricated in two parallel connected sections. One section, using a thin oxide, constitutes most of the capacitance. A second section fabricated on a thick oxide constitutes a smaller capacitance per unit area but can be laser trimmed to provide a precise capacitance without damage to the integrated circuit. The trimmable section is desirably made using a conductive electrode material that is readily removed with laser energy.
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申请公布号 |
US4190854(A) |
申请公布日期 |
1980.02.26 |
申请号 |
US19780877915 |
申请日期 |
1978.02.15 |
申请人 |
NATIONAL SEMICONDUCTOR CORP |
发明人 |
REDFERN, THOMAS P |
分类号 |
H01L23/522;H01L23/525;H01L27/08;H01L29/94;(IPC1-7):H01L27/00 |
主分类号 |
H01L23/522 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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