| 摘要 |
PURPOSE:To raise remarkably a position accuracy by forming a standard make to have a substantially triangular cross-sectional shape. CONSTITUTION:The full configuation or dimension of a standard mark is not specially defined, but the cross-sectional configuration is formed in the triangle or an approximately triangular configuration. When such the standard mark is used, because the electrons in the back face reflected from an apex of the mark triangle can be detected sharply by an electron beam scanning provided that the back face electron is used for a standard signal, an overrapped drawing accuracy of a pattern can be remarkably improved. Because the apex of the triangle is used for a target for a positioning in a center of the mark when the standard mark is used for a positioning mark, a high accuracy can be obtained in the positioning of the pattern. Such the mark can be formed by utilizing an etching speed difference or a plasma etching or the like method. |
