| 摘要 |
PURPOSE:To provide uniform microparticle film on a substrate in vacuum deposition, the substrate is located beneath a microparticle evaporator, and barriers are located above the evaporator so that convection of microparticles and gas is made uniform with respect to the substrate. CONSTITUTION:The vacuum container 11 is provided with boat 12 containing evaporating material 17 such as Sn, below which substrates 13, 14 to be deposited with film are located. The first barrier 15 is located above the boat 12, and the second barrier 16 between the boat 12 and the substatrates 13, 14. The vacuum container 11 is evacuated through the outlet 19 and Ar gas etc. is introduced through the gas inlet 18. Then, current is fed to the boat 12 to evaporate material 17. Evaporated atoms and argon gas collide to form microparticles and deposit on the surface of the substrates. Preferably, the barrier 15 is heated to direct microparticles and gas flow downward regardless of boat strucuture and operation temperature. |
