| 摘要 |
A mask for a device for the projection exposure of a semi- conductor substrate (5) comprises a mask layer (2) having a pattern of permeable and impermeable surfaces, a first glass (1) disposed on the mask layer (2), and a second glass (3) disposed on the mask layer (2) opposite the first glass (1), the second glass being directed towards a projection lens (4) and having a thickness exceeding the Rayleigh depth of the projection lens (4) in the region overlapping with the mask layer (2). The glass plates protect the mask and prevent dust particles on the mask being sharply imaged on the substrate. <IMAGE>
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