| 摘要 |
PURPOSE:To permit a high velocity electronic beam exposure by obtaining a desirable pattern signal with a process due to a sectionalizer to the data accessed by a buffer memory each block. CONSTITUTION:This exposing device includes a buffer memory 13 for accommodating a pattern data of a semiconductor chip, divided into an appropriate blocks associated with a scan area and a sectionalizer 20 wherein the usefulness or unusefulness of a pattern data is decided making a standard the scan area of an electronic beam exposing device depending upon the beginning point, the magnitude of the pattern, the shift amount at the beginning point, a lower limit value and upper limit value given to it or a part of the pattern data is processed to be cut. The sectionalizer 20 decides and processes the pattern data accessed by the buffer memory 13 each block unit and a pattern signal is generated depending upon the results obtained. According to such a construction, an appropriate exposing process can be provided for half end portion of a chip boundary with a reduced pattern amount without increasing a number of the chips. |
