发明名称 Semiconductor solar cell - with pattern of higher dopant concentration on substrate doped by ion implantation
摘要 <p>A solar cell is mfd. by producing in a semiconductor substrate a pn-junction by ion implantation. On the substrate side which is exposed to the optical radiation, one or several areas are doped more intensively than other, followed by applying a metal contact to a small part of these areas. Masks are used to give these areas fishbone, comb, grate or star shapes. This cell gives a higher current yield and minimises the loss of active area due to contacting. Such a cell can be produced in mass prodn. at a reasonably low cost.</p>
申请公布号 DE2835136(A1) 申请公布日期 1980.02.14
申请号 DE19782835136 申请日期 1978.08.10
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 RYSSEL,HEINER,DR.-ING.
分类号 H01L21/265;H01L31/0224;H01L31/18;(IPC1-7):01L31/06;01L21/265 主分类号 H01L21/265
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