| 摘要 |
PURPOSE:To prepare a silicon-containing radiation sensitive material superior in sensitivity characteristics and stability, and suitable foe formation of micropattern, by using a solvent soluble polymer having vinylsilyl groups as side chains. CONSTITUTION:What is used as a radiation sensitive material is a solvent soluble polymer of formulaI(P is a polymer molecule consisting mainly of a carbon main chain;R<1> is a divalent atomic group bonding the polymer main chain and a silicon atom;R<2> is an atomic group linked to a silicon atom except R<1> and vinyl groups, and it consists of a 1 to 4C cydrocarbon group; and n is an integer of 1,2, or 3), such as formulas I and III. |
