| 摘要 |
PURPOSE:To raise sensitivity of a positive type radiation resist without impairing this intrinsic characteristics, as well as to enhance dry etching resistance, by adding to the resist a metal halide soluble in a solvent for the resist. CONSTITUTION:A metal halide, such as ZnI1, ZnF2, MnF2, SbBr3, or SnI4, soluble in a resist solvent, such as toluene or methyl cellosolve, is added to a positive type radiation sensitive resist, such as polymethylmethacrylate in an amount of 1 to 30% by weight. This mixture is dissolved in the resist solvent to form a positive type radiation sensitive composition useful as an X-ray sensitive resist. |
