| 摘要 |
The present invention relates to a method and a device for regulating vapour layers in an apparatus for remelting in vapour phase. The device comprises thermally sensitive elements (THER1, THER2), arranged within the vat 100 of the apparatus in order to monitor the height of the primary and secondary vapour layers, and regulation means sensitive to the signals generated by the thermally sensitive elements (THER1 and THER2) to monitor, on the one hand, the supply power of heating means 110 for the primary liquid and the supply flow rate of the secondary liquid on the other hand. <IMAGE>
|
