VERFAHREN ZUR HERSTELLUNG EINES ZINKOXID-DUENNFILMS

摘要

A method of fabricating a zinc oxide thin film by a sputtering process, wherein a substance, such as boron, having an ion radius smaller than that of zinc is sputtered in an oxygen atmosphere. A body of zinc and a body of such a substance may be separately provided as targets of a cathode so that such separate targets may be simultaneously sputtered to thereby produce a thin film such as mentioned above. Alternatively, use may be made of a cathode provided with a zinc target having a substance buried therein which has an ion radius smaller than that of zinc.