发明名称 SELF SUPRORTING MASK
摘要 PURPOSE:To solve stencil problem by utilizing the diffraction effect by densely arranging many holes at a light permeable area in a mask pattern in such a way that diffraction waves from adjonining holes overlap each other. CONSTITUTION:Many small holes, with a diameter of 2 mum for instance, are densely arranged at a light permeable area in a mask pattern in such a way that diffraction waves from adjoining holes overlap each other so that the entire light permeable area of the mask pattern can be exposed by utilizing the diffraction effect. As for the shape of the holes, a circle with a nife-edge section is most desirable in order to apply the diffraction effect efficiently. When holes that have the same diameter are to be arranged, they should be spaced irregularly, and when they are to be equally spaced diameters of the holes should be changed irregularly so that the groupe of the holes does not form a plane diffraction grid.
申请公布号 JPS5512706(A) 申请公布日期 1980.01.29
申请号 JP19780084035 申请日期 1978.07.12
申请人 CHO LSI GIJUTSU KENKYU KUMIAI 发明人 ITOU CHIKAICHI
分类号 H01L21/027;G03F1/00;G03F1/60;G03F1/68;G03F7/20;H01L21/302 主分类号 H01L21/027
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