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发明名称
Characterization of semiconductor resist material during processing
摘要
申请公布号
US4874240(A)
申请公布日期
1989.10.17
申请号
US19880162431
申请日期
1988.03.01
申请人
HOECHST CELANESE
发明人
WATTS, MICHAEL P. C.;PERERA, THILOMA I.;MYERS, DAVID W.;OZARSKI, ROBERT G.;SCHIPPER, JOHN F.;TAN, RAUL V.
分类号
G03F7/26;G03F7/16;G03F7/38
主分类号
G03F7/26
代理机构
代理人
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地址
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