发明名称 PHOTO RESIST FILM COMPRISING FORMING REQUIRED IMAGE BY ACTIVE LIGHT SHIELDING MATERIAL
摘要 <p>PURPOSE:To improve the productivity of forming required images composed of photosensitive resin film on substrates by providing the photosensitive resin film on the transparent release type material layer formed beforehand with required images by active light shielding material. CONSTITUTION:Required images using active light shielding material such as printing ink is formed preferably by a rotary press printing method on a transparent release type material layer such as polyethylene terephthalate film. Next, a photosensitive resin film layer is provided to thicknesses 20 to 100mum on the back thereof and further a release type material layer such as polyethylene film, if necessary, is provided. The release type material layer is removed from this laminated photo resist film and the photosensitive resin layer is laminated in close contact onto the substrate to be permanently modified. Next, active light is radiated, after which the transparent release type material layer is removed and the photo resist images are formed by developing.</p>
申请公布号 JPS559551(A) 申请公布日期 1980.01.23
申请号 JP19780082292 申请日期 1978.07.06
申请人 HITACHI CHEMICAL CO LTD;CHUO MEIBAN MFG CO 发明人 KAKUMARU HAJIME;HAYASHI NOBUYUKI;HIRAMATSU SATORU;MACHIDA HIDEO;KAWAKAMI SHIN
分类号 G03F1/88 主分类号 G03F1/88
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