| 摘要 |
<p>PURPOSE:To enable liquid crystal cells of superior long-term reliability having undergone inorganic sealing to be produced with stability and ease by alternately repeatedly performing vapor deposition at the vapor deposition angles of different specific ranges at the time of forming the orientation treatment layers through vapor deposition. CONSTITUTION:Substrates 63, 64 are supported to a substrate table 62 which rotates by a fixed angle gamma about a pivot 61. First, vapor flow of SiO or other is evaporated from an evaporating source 65 on the substrates at 70 deg. >= theta3a, theta4a <= 30 deg.C. Next, the support table 62 is rotated by the angle gamma and vapor deposition is so accomplished as to become theta3b, theta4b <= 20 deg.C. Such repeated vapor deposition of twice, a and b, enables the pretilt angle of the liquid crystal molecules to be made sufficiently small and the TN type liquid crystal display device which makes possible dynamic driving of not causing reverse tilt at the application of voltage to be obtained. Further this will exhibit high effect even in the improved quality of the GH type color liquid crystal display.</p> |
