发明名称 |
Method and apparatus for projecting a beam of electrically charged particles |
摘要 |
Disclosed is an improvement of method and apparatus for varying the cross-section of a beam of electrically charged particles and projecting the so-varied beam onto the target. Passing through a plurality of apertured masks one after another, a beam of electrically charged particles is so deflected that the image of the overlapping area of the apertures of the masks appears on a target. According to this invention a beam of charged particles is deflected between two subsequent masks upstream so as to reduce the amount of beam current to that which is required in forming a desired image on the target, and the so-reduced beam is deflected between two subsequent masks downstream so as to trim and shape the cross-section of the beam into the exact and sharp contour as desired. The method and apparatus for varying and projecting a beam of electrically charged particles according to this invention are particularly useful in producing microcircuits.
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申请公布号 |
US4182958(A) |
申请公布日期 |
1980.01.08 |
申请号 |
US19780909217 |
申请日期 |
1978.05.25 |
申请人 |
RIKAGAKU KENKYUSHO |
发明人 |
GOTO, EIICHI;IDESAWA, MASANORI;SASAKI, TATEAKI;SOMA, TAKASHI |
分类号 |
H01J37/30;(IPC1-7):A61K27/02 |
主分类号 |
H01J37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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