| 摘要 |
A photomask comprises light shielding areas with a light shielding layer formed on a mask substrate, and a light transmitting area defined on the mask substrate by the light shielding areas, the light transmitting area being divided in a first area with a 90 DEG phase shifter formed thereon for shifting phase of transmitted light by 90 DEG , a second area with a 270 DEG phase shifter formed thereon for shifting phase of transmitted light by 270 DEG , and a third area with neither the 90 DEG phase shifter nor the 270 DEG phase shifter formed thereon, the first and the second areas being arranged without being overlapped on each other and with the light shielding areas or the third area located therebetween.
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