Photoresist structure, particularly suitable for photolithographically depositing parallel metal strips on to a base substrate, and the method for forming it,申请号GB19790009598-传众专利搜索

发明名称	Photoresist structure, particularly suitable for photolithographically depositing parallel metal strips on to a base substrate, and the method for forming it
摘要
申请公布号	GB2023857(A)	申请公布日期	1980.01.03
申请号	GB19790009598	申请日期	1979.03.19
申请人	CISE CENTRO INFORMAZIONI STUDI ESPERIENZE SPA	发明人
分类号	G03F7/38;H01L21/027;H01L21/285;H01L21/336;H01L21/338;(IPC1-7):G03C5/00;H01L21/28	主分类号	G03F7/38
代理机构		代理人
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