| 摘要 |
Compounds of the formula <IMAGE> wherein R1 and R2 are independently lower alkyl or hydrogen, provided that only one of R1 and R2 is hydrogen, m and n are each 1 or 2, the values of m and n being such that the trivalent state of P is satisfied, R is (a) halogen, (b) hydroxyl, provided that m is 2 and n is 1 when R is hydroxyl, (c) -XR5 wherein X is S or O and R5 is alkyl of 1 to 24 carbon atoms, phenyl, alkyl substituted phenyl, are suitable for stabilizing organic material against thermal, oxidative and ultraviolet light degradation.
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