发明名称 |
Heat resistant photoresist composition and process for preparing the same |
摘要 |
An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1- and 3- positions and having therein amide linkages and terminal groups partially substituted with cinnamate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.
|
申请公布号 |
US4180404(A) |
申请公布日期 |
1979.12.25 |
申请号 |
US19780961534 |
申请日期 |
1978.11.16 |
申请人 |
ASAHI KASEI KOGYO K K |
发明人 |
KIMURA, MUNEAKI;KIMURA, TAKEO;OHMURA, KAORU;SHIBASAKI, ICHIRO |
分类号 |
C08G73/14;G03F7/037;G03F7/038;(IPC1-7):G03C1/72;C08G18/00 |
主分类号 |
C08G73/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|