| 摘要 |
PURPOSE:To shorten the microprocess time by positioning several electron beams vertically to the scan direction and then giving scanning by the amount equivalent to several lines at one time. CONSTITUTION:Three units of electron gun 7, 8 and 9 are distributed linearly at one end of the vacuum container and vertically to the scan direction; and then cathode 10 discharging the heat electrons plus cylindrical 1st grid 11 coaxial to cathode 10 are provided in oposition to the three electron guns. After this, cylindrical acceleration electrode 12 coaxial to grid 11 is provided oppsoing to grid 11, and electron beams 13, 14 and 15 are converged by converging coil 16. These electron beams are then deflected through deflecting coil 17 to scan the surface of semiconductor wafer 1 which is sealed onto substrate electrode 18 at the other end. As a result, the exposure time can be reduced by the amount equivalent to the number of the beams, thus shortening the processing time. |
