| 摘要 |
PURPOSE:To form the antistatic layer of low surface electric resistance, superior film quantity and good adhesion resistance by adding the specific compound to the non-sensitive layer of the silver halide photographic material. CONSTITUTION:The compound of formula I [n is 1 to 9; A is H, Y-R3-(Y is X1, X2); B is formula II, X1, X2 (E is R1, R2; Z is X1, X2); R1, R2 are alkyl, cycloalkyl, aralkyl, aryl, alkenyl, and these may mutually bond to form alkylene chains; R3 is alkylene of 1-10C, aralkylene; X1, X2 are F, Cl, Br, I, R4O-SO2-O-, R4-SO2-O-, (HO)2-PO-O- (R4is H, aryl, alkyl of 1-8C] is contained at the use amount of preferably 0.03 to 0.4 g/m<2> in the non-sensitive layer, particularly surface protecting layer, back layer, overcoat layer, etc. of the silver halide photographic material. |
