| 摘要 |
PURPOSE:To eliminate the exposed high voltage portion without troubling the analysis of a metal element by generating plasma in an insulated tube, which is made coaxial in a waveguide tube, and by applying the plasme potential to the potential introduction terminal which is mounted in the tube wall. CONSTITUTION:Microwaves from a magnetron 11 pass through a rectangular waveguide tube 15 until they are introduced into a cavity portion 16. When a voltage is applied from a DC power source 20 to a plasma potential introducing terminal 19 so that Ar is introduced into a quartz tube 17 under a high vacuum, the electric field resulting from the microwaves is applied in the perpendicular direction to the axis of the tube 17 so that the Ar is discharged by the electric field together with the horizontal static magnetic field, which is applied from a coil 18, thereby to generate a plasma 14 in the tube 17. From this plasma 14, an ion beam is extracted to illuminate a solid test piece in a test chamber 12 thereby to effect the sputtering. These sputtering particles are taken into the plasma 14 so that the neutral sputter particles are ionized. After that, the ions pass through the tube 17 until they are introduced into a mass analyzer 13. |
