| 摘要 |
PURPOSE:To reduce equipment cost by using the device that can be used commonly for developing process and peeling process. CONSTITUTION:An ultraviolet ray radiating mechanism part 6 is disposed in front of a developing machine 30. With the operating switch of the ultraviolet ray radiating mechanism part 60 being held turned OFF, the object to be developed 10 which has been coated with positive type photoresist and exposed is placed on a belt 20 and is developed by being subsequently passed through the ultraviolet ray radiating mechanism part 60 being OFF, the developing bath 30 under operation, a rinsing bath 40 and a drying part 50, after which the ultraviolet ray radiating mechanism part 60 is operated and the object is again placed on the belt 20. After the positive type resist portions are changed to the material which dissolves in developing solution by radiating ultraviolet rays 62 thereto with a mercury lamp 61 in the ultraviolet ray radiating mechanism part 60, the resist portions are dissolved by the developing solution from a developing solution injection port 31. Thereby, developing and peeling may be accomplished with the same device. |
