| 摘要 |
PURPOSE:To form a high density diposited film with good adherence on a substrate made of substance of low heat resistance by carrying out deposition in a vacuum while irradiating the substrate with electromagnetic waves having specified energy. CONSTITUTION:In deposition of silicon oxide or the like on a substrate made of substance of low heat resistance, e.g. plastics, deposition is carried out in a vacuum while irradiating the substrate with electromagnetic waves having energy of 1-1X16<10> eV. By this method the adherence and density of a deposited film of silicon oxide or the like are raised. This method is applicable to a wide material range including a lens, glass and a plastic sheet. |
